The SC200TII is a high-vacuum dual-target magnetron sputtering system engineered for advanced materials research. Supporting single-target, dual-target co-sputtering, and alternating sputtering modes, it enables the deposition of complex multi-layer films, compositionally graded coatings, and tailored alloy thin films. With a turbomolecular-pumped vacuum environment, fully programmable recipe-driven automation, and a versatile motorized substrate stage, the SC200TII is the ideal platform for researchers in semiconductor device development, photovoltaics, battery materials, optical coatings, and functional thin-film applications.

Key Features

• Versatile Sputtering Modes  

Single-target, co-sputtering, and alternating sputtering, user-selectable for compound, alloy, and multi-layer film development.

• Programmable Multi-Layer Recipes 

Define individual layer parameters (target, current, time, pressure). The system executes the full sequence automatically.

• One-Touch Coating 

Press a single button to automatically pump down, pre-sputter, position the stage, coat according to the recipe, and vent to atmospheric pressure.

• High-Performance Vacuum 

Turbomolecular pump (90 L/s) with rotary vane backing pump achieves ≤5×10⁻³ Pa. Oil-free pump optional.

• Wide Target Compatibility 

Accepts all solid-state metallic and conductive targets (Ø50 mm, 0.1–3 mm thick).

• Built-in Contamination Prevention 

Automatic pre-sputtering shields protect targets and ensure film purity.

• Motorized Substrate Stage

Ø110 mm, accommodates substrates up to 5 inches. Motorized rotation and height adjustment. Optional tilt.

• On-the-Fly Adjustment

Sputtering current, time, and pressure adjustable in real time during deposition.